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Current research
Analytical Electron Microscopy
NRC-nano operates a Hitachi 300kV CFEG-TEM (with GIF energy-analysis system and holography facilities) and a JEOL 200kV omega-filter machine with a cryo-stage (for soft materials research). Past projects have included the investigation of alternative deconvolution techniques in EELS, the simulation and understanding of energy-loss near-edge fine structure, and investigation of phase contrast in TEM images. Also methods for measuring local thickness and mass-thickness of TEM specimens. A prevailing interest is to understand the fundamental limits of analytical microscopy and how to optimize performance.
Radiation Damage in TEM
We are interested in radiation damage in conducting specimens (knock-on displacement, surface sputtering) and non-conductors (radiolysis,ionization damage), including theory and experimental work to understand damage mechanisms. Also in methods for minimizing damage in electron microscopy and spectroscopy, as well as the use of radiation damage for nanoscale lithography.
Analytical Electron Microscopy
NRC-nano operates a Hitachi 300kV CFEG-TEM (with GIF energy-analysis system and holography facilities) and a JEOL 200kV omega-filter machine with a cryo-stage (for soft materials research). Past projects have included the investigation of alternative deconvolution techniques in EELS, the simulation and understanding of energy-loss near-edge fine structure, and investigation of phase contrast in TEM images. Also methods for measuring local thickness and mass-thickness of TEM specimens. A prevailing interest is to understand the fundamental limits of analytical microscopy and how to optimize performance.
Radiation Damage in TEM
We are interested in radiation damage in conducting specimens (knock-on displacement, surface sputtering) and non-conductors (radiolysis,ionization damage), including theory and experimental work to understand damage mechanisms. Also in methods for minimizing damage in electron microscopy and spectroscopy, as well as the use of radiation damage for nanoscale lithography.
研究兴趣
论文共 278 篇作者统计合作学者相似作者
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MICRON (2023): 103449
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Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canadano. Supplement_1 (2023): 452-453
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Samuel J. Ruttiman,Makoto Schreiber,Mark Salomons,Darren Homeniuk, Xuanhao Wang,Olivier Adkin-Kaya,Mohammad Kamal,Jesus Alejandro Marin Calzada,Patrick Price,Martin Cloutier,Misa Hayashida,Ray Egerton,
2023 48th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz)pp.1-2, (2023)
Marek Malac, Jesus Alejandro Marin Calzada,Mark Salomons, Darren Homeniuk, Patrick Price,Martin Cloutier,Misa Hayashida, Doug Vick,Sean Chen,Suliat Yakubu, Zhengxu Darren Wen,Marcus Leeson,
Microscopy and Microanalysisno. S1 (2022): 2032-2034
R F Egerton, M Watanabe
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