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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 8 篇作者统计合作学者相似作者

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Extending Deep-Uv Multi-Beam Laser Writing For Optical And Euv Masks
H. Christopher Hamaker,Paul C. Allen
NOVEL PATTERNING TECHNOLOGIES FOR SEMICONDUCTORS, MEMS/NEMS AND MOEMS 2020 (2020)
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Enhancement of the image fidelity and pattern accuracy of a DUV laser generated photomask through next-generation hardware
Robert Kiefer, Curt Jackson,Vishal Garg, David Mellenthin, John Manfredo,Peter Buck,Sarah Cohen, Cris Morgante,Paul C Allen, M White
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE) (2005): 1011-1021
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Performance of the ALTA 4700 with variable print strategy and optimized resist process
Paul C Allen, H Christopher Hamaker, Cris Morgante, Andrew Berwick,Michael White
Proceedings of SPIE, the International Society for Optical Engineering (2005): 280-286
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Next Generation Duv Alta Mask Patterning Capabilities
Paul C Allen, Michael J Bohan, Eric R Christenson, H Christopher Hamaker, Samuel C Howells, Boaz Kenan, Peter Pirogovsky, Malik K Sadiq, Robin Teitzel,Michael White, Michael E Ungureit, Alan J Wickstrom,
24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2 (2004): 279-290
引用5浏览0引用
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Duv Alta System Aerial Image Enhancement For Improved Pattern Fidelity: Phase Ii
Michael E Ungureit, Samuel C Howells, Thomas E Chabreck, J R Hubbard,Asher Klatchko, Peter Pirogovsky, Robin Teitzel, Andrew Berwick, B Skyborg,Paul C Allen, Cris Morgante,M White
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI (2004): 643-656
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Duv Alta System Aerial Image Enhancement For Improved Pattern Fidelity
Paul C Allen, Alex H Buxbaum, Samuel C Howells, Boaz Kenan,Asher Klatchko, Peter Pirogovsky, Robin Teitzel,M White
23RD ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2 (2003): 20-29
引用4浏览0引用
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