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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 17 篇作者统计合作学者相似作者

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Improved Throughput and Cost of Ownership for Monitoring of FBEOL Etch Profile
Padraig Timoney, Carrie Yurkon,Jusang Lee, Mark Altwerger,Felix Beaudoin, Aarthi Sundaram, Bert Pfefferling
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-4, (2023)
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Enhanced Cu CMP Process Control by Machine Learning Enabled Measurement on E-Test Macro
Padraig Timoney, Joseph Luke,Mark Rovereto, Jordan Wyble, Cheng-Ting Lien, Zahir Alamgir,Eswar Ramanathan
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-3, (2023)
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In-line XPS metrology using unsupervised machine learning in high volume manufacturing
Paul K. Isbester,Ganesh Subramanian,Padraig Timoney,Taher Kagalwala,Dmitry Kislitsyn, Heath Pois, Mark Klare, Daniel Kandel, Michal Yachini, Wei Ti Lee, Vanessa Zhang, Mitch Shiver,
Metrology, Inspection, and Process Control XXXVI (2022)
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Advanced Machine Learning Eco-System To Address Hvm Optical Metrology Requirements
Padraig R. Timoney, Roma Luthra, Alex Elia, Haibo Liu, Paul K. Isbester, Avi Levy,Michael Shifrin,Barak Bringoltz,Eylon Rabinovich,Ariel Broitman,Eitan Rothstein, Ran Jacoby,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
引用3浏览0引用
3
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Improving Metrology Fleet KPIs for Advanced Foundry Manufacturing
Taher Kagalwala,Padraig Timoney, Ronald Fiege, Jason Emans, Timothy Hughes, Alexander Elia,Alok Vaid, Susan Emans, Benny Vilge, Marjorie Cheng,Charles Kang, Darren Zingerman,
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)（2019）
引用1浏览0EIWOS引用
1
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Hybrid scatterometry measurement for BEOL process control
Padraig Timoney,Alok Vaid, Byeong Cheol Kang,Haibo Liu, Paul Isbester, Marjorie Cheng, Susan Ng-Emans,Naren Yellai, Matt Sendelbach,Roy Koret,Oram Gedalia
Proceedings of SPIE（2017）
引用2浏览0引用
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