基本信息
浏览量:0
职业迁徙
个人简介
Oliver D. Patterson (Senior Member, IEEE) received the S.B. degree in electrical engineering from the Massachusetts Institute of Technology, Cambridge, MA, USA, the M.S. degree in electrical engineering from the University of Wisconsin–Madison, Madison, WI, USA, and the Ph.D. degree in electrical engineering from the University of Michigan at Ann Arbor, Ann Arbor, MI, USA. He is a Distinguished Member of Technical Staff with ASML, San Jose, CA, USA. He serves the role of Principle Technologist for Hermes-Microvision, an ASML company and the industry’s leading E-beam inspection tool supplier. He has previously worked with GLOBALFOUNDRIES, IBM Microelectronics, Lucent Technologies, and Agere Systems. His research interests include the use of e-beam inspection for detection of voltage contrast, physical and pattern fidelity defects and yield improvement in general. He is a member of the ASMC Technical Committee and was the conference Co-Chairman for ASMC 2014. He has served as a Guest Editor for the IEEE Transactions on Semiconductor Manufacturing numerous times.
研究兴趣
论文共 107 篇作者统计合作学者相似作者
按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
IEEE Transactions on Semiconductor Manufacturingno. 3 (2023): 307-310
引用0浏览0EIWOS引用
0
0
IEEE Transactions on Semiconductor Manufacturingno. 3 (2023): 345-350
引用0浏览0EIWOS引用
0
0
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-5, (2022)
Wallace He, Camille Xu, Daniels Bae,Kunyuan Chen,Andy Lan, Richer Yang, Abdalmohsen Elmalk,Aiqin Jiang,Fuming Wang, Double Chung,Shane Su, Kuo-Feng Pao,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 563-569
Changan Wang,Peigen Cao, Maxence Delorme,Jen-Yi Wuu, Jiyou Fu,Fuming Wang, Bob Lin,Yiqiong Zhao, Yi-Hsing Peng,Yongfa Fan,Mu Feng, Bin Cheng,
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII (2021)
Eric Ma,Weiming Ren,Xinan Luo, Shuo Zhao,Xuerang Hu,Xuedong Liu, Chiyan Kuan,Kevin Chou, Martijn Maassen,Weihua Yin, Aiden Chen, Niladri Sen,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
Eric Ma,Kevin Chou,Martin Ebert,Xuedong Liu,Weiming Ren,Xuerang Hu, Martijn Maassen,Weihua Yin, Aiden Chen,Fei Wang,Oliver D. Patterson
Proceedings of SPIE (2019): 362-370
加载更多
作者统计
合作学者
合作机构
D-Core
- 合作者
- 学生
- 导师
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果,我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问,可以通过电子邮件方式联系我们:report@aminer.cn