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His main research activity is in Atomic Layer Deposition (ALD) of thin films for microelectronics and other applications. Real time reaction mechanism studies form an important part of this research. Another research area is preparation of nanostructured materials by for example templating with ALD and electrodeposition, and electrospinning and electroblowing of nanofibres. Mikko Ritala has published about 500 papers (h-index 75) and holds several patents. In 2007 he was nominated as ISI Highly Cited Author in the field of materials science. In 2010 he received the Alfred Kordelin Foundation recognition award. He is a receiver of the ALD innovator award 2020 for original work and leadership in ALD. In 2020 he also got the Magnus Ehrnrooth Foundation Award in Chemistry.
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Elisa Atosuo,Mikko J. Heikkila, Johanna Majlund, Leevi Pesonen,Miia Mantymaki,Kenichiro Mizohata,Markku Leskela,Mikko Ritala
APPLIED SURFACE SCIENCE (2024): 159015
Antti Kestilä, Marko Vehkamäki, Leo Nyman,Mika Salmi, Jarkko Lohilahti,Timo Hatanpää,Ugo Lafont,Mikko Ritala
Sensors and Actuators A: Physicalpp.115260, (2024)
Elisa Atosuo,Mikko J Heikkilä, Johanna Majlund, Leevi Pesonen,Miia Mäntymäki,Kenichiro Mizohata,Markku Leskelä,Mikko Ritala
ADVANCED COMPOSITES AND HYBRID MATERIALSno. 5 (2023): 1-11
Dalton transactions (Cambridge, England : 2003) (2023)
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Dalton transactions (Cambridge, England : 2003)no. 28 (2023): 9622-9630
Alexander Weiss, Jacqueline Goldmann, Sakari Kettunen,Georgi Popov,Tomi Iivonen,Miika Mattinen,Pasi Jalkanen,Timo Hatanpaa,Markku Leskela,Mikko Ritala,Marianna Kemell
ADVANCED MATERIALS INTERFACESno. 3 (2023)
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