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个人简介
Markus Karner was born in Vienna, Austria, in 1979. He received the Dipl. Ing. degree in electrical engineering from Technische Universität Wien (TU Wien), Wien, Austria, in 2004.
He has been with the Christian Doppler Laboratory for TCAD in Microelectronics, Institute for Microelectronics, TU Wien, since November 2004, where he was involved in several European and national projects. Since June 2007, he has been the Head of Global TCAD Solutions, Vienna. His scientific interests include modeling and simulation of optical devices as well as modeling of quantum effects in device simulation.
研究兴趣
论文共 113 篇作者统计合作学者相似作者
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IEEE TRANSACTIONS ON ELECTRON DEVICESno. 11 (2024): 6686-6690
CONFERENCE OF SCIENCE & TECHNOLOGY FOR INTEGRATED CIRCUITS, 2024 CSTIC (2024)
Ian O'Connor,Sara Mannaa,Alberto Bosio,Bastien Deveautour,Damien Deleruyelle, Tetiana Obukhova,Cedric Marchand,Jens Trommer,Cigdem Cakirlar,Bruno Neckel Wesling,Thomas Mikolajick,Oskar Baumgartner,Mischa Thesberg,David Pirker, Christoph Lenz,Zlatan Stanojevic,Markus Karner,Guilhem Larrieu,Sylvain Pelloquin, Konstantinous Moustakas,Jonas Muller,Giovanni Ansaloni,Alireza Amirshahi,David Atienza,Jean-Luc Rouas,Leila Ben Letaifa,Georgeta Bordea,Charles Brazier,Chhandak Mukherjee,Marina Deng, Yifan Wang,Marc Francois,Houssem Rezgui,Reveil Lucas,Cristell Maneux
2024 DESIGN, AUTOMATION & TEST IN EUROPE CONFERENCE & EXHIBITION, DATE (2024)
BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposiumpp.294-297, (2024)
IEEE Journal of the Electron Devices Societyno. 99 (2024): 1-1
2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)pp.1-4, (2024)
Felix Widauer,Xaver Klemenschits, Cedrik Balla,Gerhard Rzepa, Jose Maria Gonzalez-Medina, Bonny Dongre,Georg Strof,Zlatan Stanojevic,Markus Karner
2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)pp.1-4, (2024)
8TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM 2024pp.442-444, (2024)
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作者统计
#Papers: 113
#Citation: 3426
H-Index: 21
G-Index: 58
Sociability: 6
Diversity: 2
Activity: 5
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