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María Toledano-Luque received the Ph.D. degree from the Universidad Complutense de Madrid, Spain, in 2008. She is a Technical Staff Member with GLOBALFOUNDRIES, Malta, NY, USA. Her main responsibility is the FEOL reliability of FinFET technologies. After lecturing for three years with the UCM, she joined the Devices Reliability and Electrical Characterization Group of IMEC, Belgium, in 2011. From 2014 to 2018, she was a Senior/Principal Engineer with Samsung Electronics, South Korea, on the development of sub-10-nm technology nodes. She has authored or coauthored over 130 journal and conference papers, 3 book chapters, and presented invited conference papers.
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论文共 3 篇作者统计合作学者相似作者
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Peter C. Paliwoda,Maria Toledano-Luque,Tanya Nigam,F. Guarin, M. Nour, S. Cimino,L. Pantisano,A. Gupta, O. H. Gonzalez,M. Hauser, W. Liu, A. Vayshenker,
M. Toledano-Luque,P. Srinivasan. P. Paliwoda, S. Cimino, Z. Chbili,M. Iqbal Mahmud,A. Gupta,T. Shen,T. Kauerauf,B. Zhu,B. Min,T. Nigam
2019 Electron Devices Technology and Manufacturing Conference (EDTM)pp.218-221, (2019)
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