Luciana Meli - IBM Corp | 人才画像

基本信息

浏览量：0

职业迁徙

个人简介

暂无内容

研究兴趣

论文共 8 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选

EUV patterned gate variation reduction in next generation transistor architectures

Gopal Sankar Kenath,Martin Burkhardt, Nikhil Jain, Anna Lin,Jennifer Church,Gen Tsutsui, Stephanie Reynoso, Xuan Liu, Chris Sheraw,Pietro Montanini,Eric Miller,Indira Seshadri,

Optical and EUV Nanolithography XXXVII (2024)

引用0浏览0引用

Optimization of Spin-on Metal Oxide Resist Performance via New Development Techniques on Sub-30nm Pitch Patterning

Lior Huli, Kanzo Kato, Steven Gueci, Nathan Antonovich, Steven Grzeskowiak, David Hetzer,Eric Liu,Alexandra Krawicz,Satoru Shimura, Shinichiro Kawakami,Soichiro Okada,Karen Petrillo,

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)

引用0浏览0引用

Coater/Developer-based Techniques to Achieve Tight Pitches Towards High-NA EUV

Kanzo Kato, Lior Huli, Nathan Antonovich, David Hetzer, Steven Grezeskowiak,Eric Liu, Akiteru Ko,Satoru Shimura, Shinichiro Kawakami, Takahiro Kitano,Seiji Nagahara,Luciana Meli,

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)

引用0浏览0引用

Resist shrink characterization methodology for more accurate CD metrology

Mary A. Breton,Karen Petrillo,Jennifer Church,Luciana Meli, Jennifer Fullam,Stuart Sieg,Romain Lallement,Nelson M. Felix, Shimon Levi, Susan Zollinger, Felix Levitov,Sean Hand,

Metrology, Inspection, and Process Control XXXVI (2022)

引用0浏览0引用

Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack

Kanzo Kato, Lior Huli, Dave Hetzer, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo,Luciana Meli, Cody Murray, Alex Hubbard

Advances in Patterning Materials and Processes XXXIX (2022)

引用0浏览0引用

Coater/developer and new underlayer application to sub-30nm process