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个人简介
Li-Hong Pan received the B.S. degree in applied physics from the University of Delaware, Newark, DE, in 1986, the M.S. degree in physics from Indiana University of Pennsylvania, Indiana, PA, in 1988, and the Ph.D. degree in electrical engineering from Temple University, Philadelphia, PA, in 2001. His Ph.D. research focused on characterizing electron field emission from an atomic sharp tip in realistic 3-D geometry.
In 2001, he joined the Systems and Technology Group, IBM Semiconductor Research and Development Center, Hopewell Junction, NY. His research interests include characterization and compact modeling of deep-submicrometer and high-$k$ metal gate CMOS flicker and thermal noise and RF performance.
研究兴趣
论文共 4 篇作者统计合作学者相似作者
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Japanese Journal of Applied Physicsno. 4S (2011)
Xiaobin Yuan,Toru Shimizu,U Mahalingam,J S Brown, K Z Habib,D Tekleab, Taichi Su, S Satadru, C M Olsen,Hyunwoo Lee,Lihong Pan,Terence B Hook,
J. P. Han,T. Shimizu,L. H. Pan, M. Voelker,C. Bernicot, F. Arnaud, A. C. Mocuta, K. Stahrenberg,A. Azuma, G. Yang, M. Eller, D. Jaeger,
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