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Nomura's research is interdisciplinary and spans the fields of material science and device physics. His expertise lies in the development of wide bandgap semiconductor and electronic devices. His research opens the field of amorphous oxide semiconductor based thin-film transistor technology and significantly contributes to the advancement of oxide electronics. One key objective of his current research is to develop new amorphous oxide semiconductor materials and high-performance electronic devices for next generation wearable electronics, such as display and sensor applications. His group also has interest in advanced oxide-based nanostructured electronic devices. His research group works on a variety of aspects from material design, syntheses, film growth to device modeling, fabrication and testing based on theoretical and experimental approaches. His research aims to further develop oxide semiconductor device technology based on novel material development.
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APPLIED PHYSICS REVIEWSno. 1 (2024)
Nano lettersno. 21 (2023): 9943-9952
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Amorphous Oxide Semiconductorspp.519-538, (2022)
Japanese Journal of Applied Physicsno. SN (2022)
Amorphous Oxide Semiconductorspp.93-103, (2022)
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2022 29th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)pp.72-75, (2022)
ECS Meeting Abstractsno. 38 (2022): 2557-2557
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