He is recognized for pioneering work in plasmonic color printing, achieving record-level printing resolution at 100,000 dpi and credited for the widely-used “salty-developer” to improve the resolution of electron beam lithography. His research interests include Nanoplasmonics, 2D and 3D printed nano optical design elements (NODE), and sub-10-nm resolution lithography. He serves as Associate Editor of Science Advances, Associate Editor of Optics Express, and member of the Editorial Advisory Board of ACS Photonics. He is Fellow of OSA The Optical Society, NRF Investigator (class of 2020), and A*STAR Investigator (2010). His accolades include the IPS Nanotechnology Medal and Prize (Institute of Physics Singapore), MIT Technology Review TR35 award, and the Singapore Young Scientist Award.