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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 76 篇作者统计合作学者相似作者

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Taming the Distribution of Light in Gate-All-Around Semiconductor Devices
Janusz Bogdanowicz,Thomas Nuytten,Andrzej Gawlik,Stefanie Sergeant, Yusuke Oniki, Pallavi Puttarame Gowda,Hans Mertens, Anne-Laure Charley
Nano lettersno. 4 (2024): 1191-1196
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Reference-free x-ray fluorescence analysis with a micrometer-sized incident beam
Philipp Hönicke, André Wählisch, Rainer Unterumsberger,Burkhard Beckhoff,Janusz Bogdanowicz, Anne-Laure Charley,Hans Mertens, Névine Rochat, Jean-Michel Hartmann, Narciso Giambacorti
Nanotechnologyno. 28 (2024)
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Detection of bonding voids in multi-tier stacks with scanning acoustic microscope
Cong Chen, John Slabbekoorn,Janusz Bogdanowicz,Alain Moussa, Boyao Zhang,Filip Schleicher,Peter Hoffrogge, Ingo Wiesler, Wassim Khaldi,Alain Phommahaxay,Christophe Beral,Gerald Beyer,
2023 IEEE 25th Electronics Packaging Technology Conference (EPTC)pp.320-325, (2023)
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Model-free measurement of lateral recess in gate-all-around transistors with micro hard-X-ray fluorescence
Janusz Bogdanowicz, Yusuke Oniki,Karine Kenis, Pallavi Puttarame Gowda,Hans Mertens, Basel Shamieh, Yonatan Leon,Matthew Wormington, Juliette Van der Meer,Anne-Laure Charley
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 3 (2023)
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Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology
Richard Ciesielski, Leonhard M. Lohr,Hans Mertens, Anne-Laure Charley, Rudi de Ruyter,Janusz Bogdanowicz,Philipp Hoenicke, Najmeh Abbasirad,Victor Soltwisch
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Detection of bonding voids for 3D integration
Cong Chen, Dieter Van den Heuvel, Matteo Beggiato, Bensu Tunca Altintas,Alain Moussa,Anne Vandooren, Bart Baudemprez, Michael Schobitz, Wassim Khaldi,Janusz Bogdanowicz,Christophe Beral, Anne-Laure Charley
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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High throughput scanning probe metrology for high-NA EUV photoresist profiling
Artem Khatchaturiants,Marta Mucientes,Arseniy Kalinin, Yan Guo, Seokhan Kim, Alain Moussa,Janusz Bogdanowicz,Joren Severi,Gian F. Lorusso,Danilo De Simone, Anne-Laure Charley,Philippe Leray,
Metrology, Inspection, and Process Control XXXVI (2022)
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High-NA EUV photoresist metrology using high-throughput scanning probe microscopy
Marta Mucientes, Artem Khachaturiants, Robert Trussell,Arseniy Kalinin, Yan Guo,Erik C. Simons, Seokhan Kim, Oleg Nadyarnykh,Alain Moussa,Janusz Bogdanowicz,Joren Severi,Gian Lorusso,
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology (2022)
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