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Professor Oehrlein's research interests include scientific and technological aspects of materials processing using partially ionized gases or plasmas. Low-temperature plasmas are characterized by a gas temperature that remains close to ambient temperature, whereas the electron and ion temperatures can be much higher. These kinds of plasmas enable unique processing of advanced materials at both low pressure and atmospheric pressure. A great deal of the work in Prof. Oehrlein's research group is focused on understanding the interactions of plasma with surfaces of materials and how plasma-surface interactions may be controlled to alter properties of materials in desirable ways.
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Michael Hinshelwood,Gottlieb S. Oehrlein
PLASMA SOURCES SCIENCE & TECHNOLOGYno. 1 (2024)
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ano. 1 (2023)
Michael Hinshelwood,Gottlieb S. Oehrlein
PLASMA SOURCES SCIENCE & TECHNOLOGYno. 12 (2023)
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Bno. 6 (2023)
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