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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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论文共 94 篇作者统计合作学者相似作者

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Characteristic Mueller matrix responses and correlation analysis for vertical GAA nanowire structure manufacturing using RCWA simulated spectra
Colin Wadsworth, Ezra Pasikatan, Nicholas Keller,G. Andrew Antonelli, Alain C. Dieboldb
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Measurement of W-Recess Profile in Advanced Node 3D NAND Device with IRCD Technology Utilizing a Specialized Design-Rule Compliant Target
Nick Keller, Zhuo Chen, Peter Wang, Rostislav Grynko,Troy Ribaudo,G. Andrew Antonelli,Youcheng Wang,Joshua Frederick, Sadao Takabayashi, John Hauck,Dan Engelhard
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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3D NAND Oxide/Nitride Tier Stack Thickness Measurements with Infrared Metrology
Youcheng Wang, Zhuo Chen, Cong Wang,Nick Keller,G. Andrew Antonelli,Zhuan Liu,Troy Ribaudo, Rostislav Grynko
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-8, (2023)
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Non-Contact, In-Line Thermal Characterization Capability with Time Domain Thermoreflectance
Robin Mair,G. Andrew Antonelli,Manjusha Mehendale, Priya Mukundhan, Beth May,Karen Terry, Nathaniel Brandt, Xiaoyue Phillip Huang,Tong Zhao
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-4, (2022)
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Scatterometry of nanowire/nanosheet FETs for advanced technology nodes
Madhulika Korde,Subhadeep Kal, Cheryl Alix,Nick Keller,G. Andrew Antonelli,Aelan Mosden,Alain C. Diebold
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 426-429
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Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes
G. Andrew Antonelli,Nick Keller, Ribaudo Troy Daniel,Franklin J. Wong,Wenmei Ming, Hepeng Ding, Zhuo Chen, Ross Grynko, Ahmad Fumani,Zhuan Liu, Sadao Takabayashi, John Hauck,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 396-405
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